| | Standard Course Syllabus | Course Supervisor | Date of Approval |
| | Dept. of Electrical and Computer Engineering | Lu | 2/08 |
| | 632 | Introduction to Nanofabrication and Nanomanufacturing |
| | 2. | CATALOG DESCRIPTION |
| | Novel nanomanufacturing techniques will be introduced with a focus on top down approaches and a brief introduction of |
| | bottom up approaches. |
| | Quarters of Offering | Credits | | Level | Class Meeting |
| | Au Qtr. | 3 | U G | 3 cl. |
| | Course Prerequisites |
| | Prereq: 331 or MSE 205 or pemission of instructor. Not open to students with credit for 694L. |
| | 3. | PREREQUISITES BY TOPIC |
| | General knowledge of the structure, properties, and processing of materials |
| | Courses that require this as a direct prerequisite |
| | none |
| | 4. | Text(s) and Other Course Materials | Author(s) | Publisher |
| | No text |
| | References (supplemental reading) |
| | [1] "Introduction to Nanoscale Science and Technology," edited by Massimiliano Di Ventra, Stephane Evoy, and James R. |
| | Heflin Jr., Springer, 2004. |
| | [2] "Nanotechnology: Basic Science and Emerging Technologies," by Mick Wilson, Kamali Kannangara, Geoff Smith, |
| | Michelle Simmons, and Burkhard Raguse, CRC Press, 2002. |
| | [3] "Microfabrication and Nanomanufacturing," by Mark J. Jackson, CRC Press, 2005. |
| | [4] Selected journal papers and handouts. |
| | 5. | COURSE OBJECTIVES |
| | 1. Students will learn the fundamentals of nano-fabrication and manufacturing technologies. (Criteria 3(a), (b), (c), (d), (e), |
| | (k)) |
| | 2. Students will be exposed to the instrumentation and equipment for nanoscale device processing and |
| | characterization.(Criteria 3(a), (c), (k)) |
| | 3. Students will develop basic understanding of integration of nanoscale devices and systems for biomedical |
| | applications.(Criteria 3(a), (c), (d)) |
| | 6. | TOPICS AND (# OF LECTURES) |
| | Introduction to nanotechnology (1) |
| | Optical lithography (1) |
| | Electron beam lithography (1) |
| | X-ray lithography and LIGA (1) |
| | Nanoimprinting and Dip-pen lithography (1) |
| | Thin film deposition (1) |
| | Dry etching technologies (2) |
| | Bulk and surface micromachining techniques for the fabrication of master molds (1) |
| | Polymer processing for biomedical applications (2) |
| | Scanning Probe Microscopy (1) |
| | Near-field optical techniques for nanoscale fabrication and characterization (1) |
| | Self-assembly and self-organization (1) |
| | Integration of nanoscale biomedical devices and systems (2) |
| | 7. | CLASS MEETING PATTERN | (For example, "3cl." means 3 48-min classes per week.) |
| | 3 cl. |
| | Thursday, August 14, 2008 09:18 AM |
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