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Research Areas and Philosophy of the
Ringel Group
Professor Ringel and EMDL encourage a research philosophy that vertically integrates research and education starting from the applied
physics of materials synthesis through process science to the fabrication and application of devices. The figure below shows a snapshot
of EMDL activities and how they fit within the larger picture of materials/devices research.
Materials Research Areas of the
Ringel Group
III-V Compound Semiconductors. Research involves the growth and characterization (structural, chemical,
electronic, optical)
properties of III-V compounds, heterostructures and nanostructures based on (Ga,In,Al)/)(As,P,Sb). Focus is on MBE growth, defects,
interface and surface properties and growth/relaxation dynamics in these materials and how these correlate with electronic and
optoelectronic properties.
III-V/Si Heterogeneous Integration and Substrate Engineering. Research on the use of engineered SiGe substrates via the > 15
year Ringel-Fitzgerald (MIT) collaboration to enable lattice mismatched integration of a wide range of III-V compounds and
heterostructures with Si is ongoing. Focus is on heterovalent interfaces, all forms of materials mismatch, optimized bandstructure
engineering and defect control.
Metamorphic III-V Compounds and Lattice-Mismatched Heteroepitaxy. Research on the optimization of lattice constant grading
based on both the anion (group V) and cation (group III) sublattice is being conducted to span lattice constants between those of Si and
InAs. This is augmented through the newly formed Heterogeneous Materials Integration Initiative (HMI2) partnership with the Air Force
Research Laboratory at Wright Patterson Air Force Base. Studies include comparative studies of the interrelationships between growth,
relaxation dynamics, electron transport and defects as a function of material system.
Defects and Trap Characterization in Semiconductors. Detailed exploration of the physics and impact of deep level defects in
semiconductors that include GaN and AlGaN, III-As, III-P, and SiGe materials are ongoing using a wide range of state of the art deep
level spectroscopy methods. The roles played by materials growth method and parameters, processing conditions, high-energy radiation,
alloy composition, and other issues are all part of detailed explorations that are critical for photovoltaics, electronics,
optoelectronics and other device technologies.
Metal-Semiconductor Nanostructures. Crystalline metal-semiconductor structures are being grown and characterized for research
on plasmonic and spintronic properties.
Device Research Areas of the Ringel Group
Solar Energy Conversion Devices. Intense research is ongoing to continue our group's pioneering activities to develop hybrid
III-V/Si solar cell technologies for both space and terrestrial solar energy conversion applications. Work on multi and single junction
III-V/SiGe solar cells, 3-D engineered photovoltaic (PV) concentrators is ongoing, and methods to integrate super efficient thin
crystalline films with inexpensive and thin substrates are being explored.
Optoelectronics. Primary emphasis is on the monolithic integration of visible and infrared band laser diodes and light emitting
diodes with Si, analogous to our photovoltaics programs. Quantum and Nanostructured III-V's incorporating multiple quantum well,
superlattice and Bragg reflectors, with process science to achieve optimized optical confinement using methods that are compatible with
Si processing are being explored.
Thermal Energy Conversion Devices. Research includes efforts to advance both thermophotovoltaic (TPV) and thermoelectric (TE)
devices based on unique tandem structures, bandgap engineering and selective use of nanostructures. Devices are developed using the
metamorphic narrow bandgap materials discussed above. The TE effort is a collaboration with Prof. Heremans and his group in Mechanical
Engineering.
Ultra-High-Speed Electronics and Metamorphic Nanoelectronics. Research is intensely focused to incorporate the ultra-high
mobility large lattice constant III-V semiconductors explored in the metamorphic materials group, described above, into various FET and
HBT transistor structures and nanoelectronic circuits. This activity is in collaboration with Prof. Wu Lu and his research group.
Wide Bandgap RF Electronics. As part of an ONR MURI team, we are exploring the properties and impact of electronic traps within
AlGaN/GaN HEMT devices. This effort is a device-driven extension of the efforts described above in the Defect Characterization
component of the Ringel group.
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