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EE734 Example A simple simulation of a LOCOS process |
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Back to the Table of Contents for the example |
Nitride Etch |
To remove the nitride I did a simple Geometrical etch. I selected Commands ® Process ® Etch ® Etch. I set it up to etch Material nitride Left of Etch Location = 5 mm. This will remove the nitride from half of the sample and puts the boundary for the selective oxidation in the middle of the sample. This geometric etch basically simulates a perfectly vertical etch that is also perfectly selective to etch only nitride.